alpha-Ta Films on c-plane Sapphire with Enhanced Microstructure

Superconducting films of alpha-Ta are promising candidates for the fabrication of advanced superconducting qubits. However, alpha-Ta films suffer from many growth-induced structural inadequacies that negatively affect their performance. We have therefore explored a new synthesis method for alpha-Ta films which allows the growth of these films with unprecedented quality. Using this method, high quality alpha-Ta films are deposited at a comparably high substrate temperature of 1150 °C. They are single-phase -Ta and have a single out-of-plane (110) orientation. They consist of grains ≥ 2 um that have one of three possible in-plane orientations. As shown by scanning transmission electron microscopy and electron energy loss studies the substrate-film interfaces are sharp with no observable intermixing. The obtained insights into the epitaxial growth of body-centered-cubic films on quasi-hexagonal substrates lay the basis for harnessing the high structural coherence of such films in various applications.